MULTI-AGENT PARALLEL IMPLEMENTATION OF PHOTOMASK SIMULATION IN PHOTOLITHOGRAPHY

Authors

  • Syarhei M. Avakaw
  • Alexander A. Doudkin
  • Alexander V. Inyutin
  • Aleksey V. Otwagin
  • Vladislav A. Rusetsky

DOI:

https://doi.org/10.47839/ijc.11.1.550

Keywords:

Aerial Image Simulation, Multi-agent, Integrated Circuit, Photolithography, Parallel Algorithm

Abstract

A framework for paralleling aerial image simulation in photolithography is proposed. Initial data for the simulation representing photomask are considered as a data stream that is processed by a multi-agent computing system. A parallel image processing is based on a graph model of a parallel algorithm. The algorithm is constructed from individual computing operations in a special visual editor. Then the visual representation is converted into XML, which is interpreted by the multi-agent system based on MPI. The system performs run- time dynamic optimization of calculations using an algorithm of virtual associative network. The proposed framework gives a possibility to design and analyze parallel algorithms and to adapt them to architecture of the computing cluster.

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Published

2014-08-01

How to Cite

Avakaw, S. M., Doudkin, A. A., Inyutin, A. V., Otwagin, A. V., & Rusetsky, V. A. (2014). MULTI-AGENT PARALLEL IMPLEMENTATION OF PHOTOMASK SIMULATION IN PHOTOLITHOGRAPHY. International Journal of Computing, 11(1), 45-54. https://doi.org/10.47839/ijc.11.1.550

Issue

2012, Volume 11, Issue 1

Section

Articles

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