AVAKAW, S. M.; DOUDKIN, A. A.; INYUTIN, A. V.; OTWAGIN, A. V.; RUSETSKY, V. A. MULTI-AGENT PARALLEL IMPLEMENTATION OF PHOTOMASK SIMULATION IN PHOTOLITHOGRAPHY. International Journal of Computing, [S. l.], v. 11, n. 1, p. 45-54, 2014. DOI: 10.47839/ijc.11.1.550. Disponível em: https://computingonline.net/computing/article/view/550. Acesso em: 2 may. 2024.