Avakaw, S. M., A. A. Doudkin, A. V. Inyutin, A. V. Otwagin, and V. A. Rusetsky. “MULTI-AGENT PARALLEL IMPLEMENTATION OF PHOTOMASK SIMULATION IN PHOTOLITHOGRAPHY”. International Journal of Computing, vol. 11, no. 1, Aug. 2014, pp. 45-54, doi:10.47839/ijc.11.1.550.