Avakaw SM, Doudkin AA, Inyutin AV, Otwagin AV, Rusetsky VA. MULTI-AGENT PARALLEL IMPLEMENTATION OF PHOTOMASK SIMULATION IN PHOTOLITHOGRAPHY. IJC [Internet]. 2014Aug.1 [cited 2024Nov.22];11(1):45-54. Available from: https://computingonline.net/computing/article/view/550